Benefit Cosmetics

The POREfessional Deep Retreat Clay Mask

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Ingredient Profile

Aqua (Water), Kaolin, Silica, Glycerin, Butylene Glycol, Pentylene Glycol, Ci 77007 (Ultramarines), PEG-40 Sorbitan Peroleate, Sodium Acrylates Copolymer, Caprylic/​Capric Triglyceride, Ci 77499 (Iron Oxides), Hydroxyacetophenone, Lecithin, Mica, Chlorphenesin, Bisabolol, Ci 77491 (Iron Oxides), Hydrogenated Vegetable Oil, Opuntia Coccinellifera Flower Extract, Ci 77891 (Titanium Dioxide), Trisodium Ethylenediamine Disuccinate, Simmondsia Chinensis (Jojoba) …

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